Automatic gas dosing for vacuum process
15 Jan 2000
Pfeiffer Vacuum has introduced an easy-to-use gas dosing system for regulating vacuum processes. Comprising a paired valve and controller, the system can be integrated into plant controls.
The system consists of an EVR 116 control valve and an RVC 200 controller. The former, made from stainless steel and corrosion-resistant, provides `precise and reproducible' control of pressures from 5x10-6-1200mbar l/s. It is equipped with stepping and integrated motors, drive electronics and position sensors.
The control unit can use pressure sensors with outputs of 0-10V dc as signal generators, and features an LCD display and control keys. Pfeiffer Vacuum compact gauges can be used to connect the dosing system to pressure measurement devices within the vacuum chamber.
